Voltaix™

Voltaix™ at the heart of our chips

Voltaix™ products are used to deposit thin films via Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD). Voltaix™ products are critical to channel engineering and advanced memory structures.  These structures enable computer chips with lower power consumption and higher memory density, which enhance our personal mobility and connectivity.

Key Voltaix™ materials include disilane, germane and diborane used in the manufacture of logic, memory, and photovoltaic devices. These products are developed in collaboration with leading researchers, enabling frame-breaking innovations in thin film properties, and thin film processing.

Excellence in design enabling quality and reliability

Thin film properties are very sensitive to the exact chemical composition of the precursor gas used to make them. Our chemists and engineers designed our manufacturing and purification processes with the end application in mind, “thinking big” from the start. As a result, Voltaix™ products are produced in a manner that yields highly consistent chemical fingerprints, thereby reducing variation in customer’s manufacturing processes.

Voltaix received ISO 9001 certification in March 2002.

The International Organization for Standardization (ISO) has developed Q9001 as a common quality standard for major companies. It provides a management framework that defines a company’s processes and supplies a controlled approach for the manufacturing of products that generates a consistent level of quality and provides a clear basis for continuous improvement of quality.

This certification allows Voltaix™ to continue to meet and exceed customers’ requirements as the need for higher quality products continues to evolve.